Titanium Sputtering Target Disc

Our Titanium Sputtering Target Disc is manufactured from high purity titanium material, specially designed for PVD coating, vacuum deposition and semiconductor thin film applications.

With excellent corrosion resistance, stable sputtering performance and uniform grain structure, our titanium targets ensure consistent film quality and high deposition efficiency.

Material Grades Available

• Grade 1 Titanium (High ductility)

• Grade 2 Titanium (Most widely used industrial grade)

• Grade 5 Titanium (Ti-6Al-4V)

• High Purity Titanium (≥99.9% / 99.99% upon request)

Product Specifications

• Shape: Disc / Round target

• Diameter: Customized (commonly 50mm – 400mm)

• Thickness: Customized

• Surface Finish: Precision machined

• Bonding: Indium bonding / Elastomer bonding available

• Backing plate: Copper bonding available upon request

All targets can be manufactured according to drawings or specific sputtering system requirements.

Applications

• PVD (Physical Vapor Deposition)

• Magnetron sputtering systems

• Optical coating

• Decorative coating

• Semiconductor thin film deposition

• Solar industry coating

Key Features

✔ High purity raw material
✔ Uniform microstructure
✔ Excellent sputtering stability
✔ Low impurity content
✔ Precision machining tolerance
✔ Custom sizes available

Why Choose Us?

As an experienced titanium manufacturer, we provide:

• Strict raw material control

• Advanced CNC machining capability

• Stable quality control system

• Fast response and export experience

• Flexible customization service

We support small batch trial orders and long-term supply contracts.

Custom Service

If you have specific requirements for:

• Target purity

• Grain size

• Bonding type

• Backing plate

• Packaging for cleanroom use

Please contact us with your drawing or technical specification.