Our titanium sputtering target disc is manufactured from high-purity titanium, designed for use in PVD coating and magnetron sputtering systems. It delivers stable sputtering performance, uniform thin film deposition, and excellent adhesion.

Key Features

• ✔ High purity titanium (99.9% – 99.99%)
• ✔ High density and low porosity
• ✔ Uniform grain structure
• ✔ Excellent corrosion resistance
• ✔ Stable sputtering rate
• ✔ Custom sizes and central hole available

Applications

1. Semiconductor Industry

• Barrier layers and adhesion films

2. Optical Coating

• TiO₂ films for lenses and glass

3. Tool Coating

• TiN coatings for cutting tools

4. Decorative Coating

• Watches, jewelry, and hardware

Specifications

• Material: Pure Titanium (Gr1 / Gr2)
• Purity: 99.9% / 99.99%
• Shape: Round Disc
• Diameter: Custom
• Thickness: Custom
• Bonding: Optional backing plate
• Surface: Machined / polished

Why Choose Our Titanium Targets

• Strict quality control for consistent performance
• Advanced machining for precise tolerances
• Support for custom designs and OEM orders
• Reliable supply for industrial and research applications

Customization Options

We provide tailored solutions including:

• Custom dimensions
• Central hole machining
• Backing plate bonding (Cu / Mo)
• Ultra-high purity processing

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Contact us today for pricing, samples, and technical support.