High-Purity Molybdenum Sputtering Target for Thin Film Deposition

Short Description:

High-Purity Molybdenum Sputtering Targets (99.95% Mo) - Premium PVD coating solutions for semiconductor, display and solar applications. Featuring ultra-dense (≥99.5% TD) construction, low particle counts (<50ppm), and exceptional thermal stability. Available in standard sizes (1"-12" dia) or custom configurations with bonded/unbonded options. ASTM F660 certified for consistent film quality....

Material Grade: 99.95% Mo (Pure) | MoLa (Lanthanum Alloy) | TZM Alloy
Density: 10.2 g/cm³
Diameter: customizable
Application: PVD Coating for IC & Display
Melting Point : 2620°C

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High-Purity Molybdenum Sputtering Target for Thin Film Deposition

Key Performance Features:
✔ Low Particle Generation - Minimizes coating defects
✔ Excellent Thermal Stability - Maintains structural integrity at high power
✔ Uniform Erosion - Optimized grain structure for consistent deposition
✔ Long Service Life - 1000+ cycles typical (depends on process parameters)

Applications:
• Semiconductor: Back-end metallization, barrier layers
• Display: TFT-LCD/OLED electrode coatings
• Solar: CIGS back contacts
• Optics: AR/IR coatings
• Industrial: Wear-resistant tool coatings

Why Choose Our Targets?
✅ 15+ years PVD target manufacturing experience
✅ Full material traceability with mill certificates
✅ Custom shapes and alloys available
✅ Rigorous QC

Technical Support Available - Contact Our Experts Today!

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