TZM Alloy Molybdenum Crucible for Crystal Growth & Evaporation

 TZM Alloy Molybdenum Crucible  for Crystal Growth & Evaporation
  •  TZM Alloy Molybdenum Crucible  for Crystal Growth & Evaporation
  •  TZM Alloy Molybdenum Crucible  for Crystal Growth & Evaporation
  •  TZM Alloy Molybdenum Crucible  for Crystal Growth & Evaporation
  •  TZM Alloy Molybdenum Crucible  for Crystal Growth & Evaporation

Short Description:

High-purity molybdenum crucibles (99.95% Mo) offer exceptional performance in extreme high-temperature environments up to 1900°C, featuring superior thermal conductivity and minimal contamination for critical applications like sapphire crystal growth, CVD processes, and rare earth melting. ...


  • Material Grade: 99.95% Mo (Pure) | MoLa (Lanthanum Alloy) | TZM Alloy
  • Density: 10.2 g/cm³
  • Diameter: customizable
  • Application: CVD/Sapphire Growth
  • Melting Point : 2620°C

Product Details

Product Tags

TZM Alloy Molybdenum Crucible  for Crystal Growth & Evaporation


Special Features:

1. Ultra-High Purity - Minimizes contamination in sensitive processes

2. Thermal Shock Resistant - Withstands rapid temperature changes

3. Custom Coatings Available - MoSi₂ for oxidation protection (up to 1700°C)

4. Precision Manufacturing - ±0.5% dimensional tolerance


Technical Data

Parameter

Specification

Remarks

Material Composition

99.95% Pure Mo / TZM Alloy (Mo-0.5Ti-0.1Zr)

High-purity 99.99% available on request

Density

10.2 g/cm³

Actual: 9.8-10.1 g/cm³ (process dependent)

Melting Point

2620°C

Pure molybdenum

Max Working Temperature

1900°C (inert/vacuum)

1700°C with MoSi₂ coating in oxidizing env.

Thermal Conductivity

138 W/m·K @ 20°C

Decreases to 98 W/m·K @ 1000°C

Thermal Expansion

4.8×10⁻⁶/°C (20-1000°C)

Matches silicon/sapphire CTE

Primary Applications:
• Semiconductor: CVD reactors, MOCVD, wafer processing
• Crystal Growth: Sapphire, LED, laser crystals
• Vacuum Metallurgy: Rare earth melting, alloy production
• Research Labs: High-temperature material testing



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