Zirconium Sputtering Target for Semiconductor Coating

High-purity zirconium sputtering targets (99.95%-99.99%) designed for precision thin film deposition in advanced coating applications. Our Zr targets feature:

• Ultra-high density (≥6.49 g/cm³) for superior film quality

• Excellent thermal stability (1852°C melting point)

• Multiple diameters (1"-12") to fit all PVD systems

• Multiple grades (Zr-702, Zr-705) for specialized applications

Ideal for:
✓ Semiconductor manufacturing
✓ Optical coatings
✓ Decorative finishes
✓ Solar cell production
✓ Corrosion-resistant industrial coatings

Available in standard and custom configurations to meet your exact specifications. Contact us for technical specifications and pricing.

Key advantages:
• Low particle generation
• Consistent deposition rates
• Custom purity and sizing options
• Competitive OEM pricing

Request a quote today for your zirconium sputtering target requirements!