99.95% Pure 50-500ml Capacity High-Purity Tungsten Crucible

99.95% Pure 50-500ml Capacity High-Purity Tungsten Crucible
  • 99.95% Pure 50-500ml Capacity High-Purity Tungsten Crucible
  • 99.95% Pure 50-500ml Capacity High-Purity Tungsten Crucible
  • 99.95% Pure 50-500ml Capacity High-Purity Tungsten Crucible
  • 99.95% Pure 50-500ml Capacity High-Purity Tungsten Crucible

Short Description:

High-purity tungsten crucibles for extreme-temperature applications. Ideal for crystal growth (sapphire, SiC), vacuum coating, and semiconductor industries. 99.95% pure, machined or sintered, custom sizes available. Trusted by labs & manufacturers worldwide. Browse our durable, refractory-grade tungsten crucibles today...


  • Material Grade: Pure Tungsten (99.95%)
  • Density: 19.3 g/cm³
  • Capacity: 50ml-1000ml
  • Application: Sapphire Crystal Growth
  • Melting point: 3422 °C

Product Details

Product Tags

High-Purity Tungsten Crucible for Sapphire Crystal Growth


Key Advantages:

✓ Ultra-high density

✓ Low thermal expansion & deformation

✓ Custom dimensions (OD 10-200mm, thickness 1-20mm)

✓ Surface polishing & drilling options



Grade:

GB grade

W

Mo

Ni

W1

99.95%

0.01

0.003

WAL1、WAL2

99.95%

0.01

0.005

REMARKS: IMPURITIES ACCORDING TO GB/T 3875-2006


Specification:

D(Tolerance)

L(Tolerance)

surface

10~500

10~750

Raw, Turned, polished


Condition

Specification(mm)

tolerance(mm)

Diameter(mm)

Length(mm)

Diameter(mm)

Length

(mm)

Sintering

10-500

10-750

±5

±5

Forging

10-100

10-120

±1

±2

Sintering and Machining

100-450

10-500

±0.5

±1



Applications Section:


1. Crystal Growth(Sapphire, SiC, LiTaO)

2.Vacuum Evaporation & Coating(PVD, E-beam)

3.Semiconductor Processing(AlN, GaN substrates)

4.High-Purity Melting(Rare earth metals, oxides)



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